The HS-AFM can create and modify nanostructures through a range of techniques, including local oxidation nanolithography, nanoscribing and local heating. Simultaneous high-speed imaging enables close monitoring of the fabrication process, minimising rework.

University of Bristol Interface Analysis Centre Logo being written to generate a silicon oxide mask on silicon.

References

  • Vicary, J et al., 2009, ‘Real-time nanofabrication with high-speed atomic force microscopy’. Nanotechnology, vol 20
  • Vicary, J et al., 2007, ‘Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds’. Ultramicroscopy, vol 108., pp. 1120 – 1123